Sevique, a revolutionary new skincare line, is blending the best natural ingredients with the most advanced skincare science to specialize in highly concentrated formulations that provide real transformation and maximum results with no harsh additives.
This elegant skin care collection is rich in anti-oxidants, anti-inflammatories and has an innovative delivery system which penetrates the deepest layers of skin, allowing products to work naturally from the inside out to hydrate, restore and revitalize the natural balance of almost any skin type.
After suffering the toll cancer treatments had taken on her skin, founder Susan Nickell personally realized the need for natural skin care products that work as well if not better than their chemical based counterparts.
Susan set forth to develop these products in collaboration with a team of skin care care experts— including a world-class chemist—who have spent their careers in the industry developing and launching some of the most prestigious skin care lines available for the past 35 years.
Products have been received amazingly well in initial consumer use trials. In an independent trial with 100 participants:
95% saw reduction in pore size and wrinkle appearance; diminishing appearance of skin imperfections such as age spots, blemishes, and breakouts—an area not initially a study focus; and treatment of skin irritations such as dryness and rosacea.
94% of candidates reported they started to see a notable difference in their skin after a few weeks of use, many reported a change within days.
One of the most exciting things found is that 97% of testers would recommend use of the products to others making us confident our products are on track to be the best, most potent, natural alternative to any chemical-based skincare product on the market today.
As
a licensed Aesthetician I am always looking for the newest and best
products. I began using Sevique and within the first week I saw amazing
results! - Genna Rodriquez
For more information contact Kim Briggs at (406) 257-2224.
